Comparative Study of Magnetic and Electrical Behavior of Titanium-Niobium Alloy Thin Films Prepared by RF-Magnetron Sputtering Method

This research paper reports on combined magnetic and electrical properties of Ti1-xNbx (0.0˂x≤0.5) alloy thin films with x= 0.1, 0.2, 0.3, 0.4 and 0.5 (i.e. 10, 20, 30, 40 and 50 %) atomic weight grown on glass substrate by using RF Magnetron sputtering method. We have used three substrate temperature variations (100°C, 200°C and 300°C) for these five alloy thin film samples. The Magnetic hysteresis (M-H) behavior of Ti1-xNbx alloy thin films was observed at room temperature by using VSM with the applied magnetic field of ± 2 Tesla. VSM results reveal that with increase in niobium content from 10% to 50% of alloy, there is no clear trend in pattern of magnetization of the Ti1-xNbx alloys across all temperature variations (100°C, 200°C and 300°C). VSM result shows the paramagnetic behavior for majority of samples at room temperature and some of the Ti1-xNbx alloy thin films changed from paramagnetic to ferromagnetic-like properties. This interesting evolution of magnetic properties of Ti1-xNbx thin alloys evokes new understanding of these alloy thin films. The electrical resistivity of the films as a function of Ti1-xNbx alloy and temperature variation were studied by Hall Measurements. Resistivity of thin films samples decreases with increase in niobium content for all substrate temperature at 100°C, 200°C and 300°C.