Comparative Study of Magnetic and Electrical Behavior of Titanium-Niobium Alloy Thin Films Prepared by RF-Magnetron Sputtering Method


Department of Applied Sciences, I. K. Gujrat Punjab Technical University, Jalandhar, Punjab, India.

Anand K. Tyagi
Department of Applied Sciences, SBS State Technical Camus, Firozpur, Punjab, India.


This research paper reports on combined magnetic and electrical properties of Ti1-xNbx (0.0˂x≤0.5) alloy thin films with x= 0.1, 0.2, 0.3, 0.4 and 0.5 (i.e. 10, 20, 30, 40 and 50 %) atomic weight grown on glass substrate by using RF Magnetron sputtering method. We have used three substrate temperature variations (100°C, 200°C and 300°C) for these five alloy thin film samples. The Magnetic hysteresis (M-H) behavior of Ti1-xNbx alloy thin films was observed at room temperature by using VSM with the applied magnetic field of ± 2 Tesla. VSM results reveal that with increase in niobium content from 10% to 50% of alloy, there is no clear trend in pattern of magnetization of the Ti1-xNbx alloys across all temperature variations (100°C, 200°C and 300°C). VSM result shows the paramagnetic behavior for majority of samples at room temperature and some of the Ti1-xNbx alloy thin films changed from paramagnetic to ferromagnetic-like properties. This interesting evolution of magnetic properties of Ti1-xNbx thin alloys evokes new understanding of these alloy thin films. The electrical resistivity of the films as a function of Ti1-xNbx alloy and temperature variation were studied by Hall Measurements. Resistivity of thin films samples decreases with increase in niobium content for all substrate temperature at 100°C, 200°C and 300°C.